IMPACT OF EVAPORATION RATE ON MULTI-LAYER ANTIREFLECTIVE FILM QUALITY USING SiO2 /SiO MATERIAL PAIRS

  • Tran Anh Tuan Intitute of Science and Technology, Ministry of Public Security
Keywords: Evaporation rate, SiO2/SiO antireflective film, optical thin film quality

Abstract

This paper presents the results of research, calculation, manufacturing of three-layer antireflective coating using SiO2/SiO material pairs on BOC ADWARDS FL500 vacuum evaporator. The results are used to evaluate the effect of film evaporation rate on the quality of multi-layered anti-reflective coating, in the near infrared and short wavelength infrared region.

References

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H. Angus Macleod, “Thin-Film Optical Filters”, CRC Press 2010.

Leon I. Maissel and Reinhard Glang, “Handbook of Thin Film Technology”, McGraw-Hill Book Company, 1970.

Michael Bass et al, “HANDBOOK OF OPTICS”, Volume IV Optical Properties of Materials, Nonlinear Optics, Quantum Optics, 2010

Published
2020-04-15
How to Cite
Tran Anh Tuan. (2020). IMPACT OF EVAPORATION RATE ON MULTI-LAYER ANTIREFLECTIVE FILM QUALITY USING SiO2 /SiO MATERIAL PAIRS. UTEHY Journal of Science and Technology, 25, 57-62. Retrieved from http://tapchi.utehy.edu.vn/index.php/jst/article/view/356